Characterization of Advanced Ceramic Materials Thin Films Deposited on Fe-C Substrate

Florea, Costel Dorel; Munteanu, Corneliu; Cimpoesu, Nicanor; Sandu, Ioan Gabriel; Baciu, Constantin; Bejinariu, Costica

Costel Dorel Florea, Corneliu Munteanu, Nicanor Cimpoesu, Ioan Gabriel Sandu, Constantin Baciu, Costica Bejinariu

Characterization of Advanced Ceramic Materials Thin Films Deposited on Fe-C Substrate

Abstract:

Complex ceramic superficial ceramic layers (Al2O3, SiO2, YO, ZrO2) were obtained by atmospheric plasma deposition, industrial wide application method, on a metal support Fe-C (FC 250). The substrate was sandblasted mechanically prior to depositing 6 successive layers of ceramic material. The obtained layers were analyzed structurally (scanning electron microscopy, SEM), chemical (spectroscopy of X-ray, EDAX) and mechanically (scratch tests) to characterize the new compound material obtained (thin layer-substrate). It was observed from the experimental results that there was a relationship between the state of the surface of the substrate and the adhesion of the ceramic layers to the metal surface.

Keywords:
complex ceramic; plasma; SEM; EDAX; scratch

Issue: 2017, Volume 68, Issue 11

Pages: 2582-2587

Publication date: 2017/12/15

https://doi.org/10.37358/RC.17.11.5933

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This article is published under the Creative Commons Attribution 4.0 International License

Citation Styles

Cite this article as:
FLOREA, C.D., MUNTEANU, C., CIMPOESU, N., SANDU, I.G., BACIU, C., BEJINARIU, C., Characterization of Advanced Ceramic Materials Thin Films Deposited on Fe-C Substrate, Rev. Chim., 68(11), 2017, 2582-2587.

Vancouver
Florea CD, Munteanu C, Cimpoesu N, Sandu IG, Baciu C, Bejinariu C. Characterization of Advanced Ceramic Materials Thin Films Deposited on Fe-C Substrate. Rev. Chim.[internet]. 2017 Nov;68(11):2582-2587. Available from: https://doi.org/10.37358/RC.17.11.5933

APA 6th edition
Florea, C.D., Munteanu, C., Cimpoesu, N., Sandu, I.G., Baciu, C. & Bejinariu, C. (2017). Characterization of Advanced Ceramic Materials Thin Films Deposited on Fe-C Substrate. Revista de Chimie, 68(11), 2582-2587. https://doi.org/10.37358/RC.17.11.5933

Harvard
Florea, C.D., Munteanu, C., Cimpoesu, N., Sandu, I.G., Baciu, C., Bejinariu, C. (2017). 'Characterization of Advanced Ceramic Materials Thin Films Deposited on Fe-C Substrate', Revista de Chimie, 68(11), pp. 2582-2587. https://doi.org/10.37358/RC.17.11.5933

IEEE
C.D. Florea, C. Munteanu, N. Cimpoesu, I.G. Sandu, C. Baciu, C. Bejinariu, "Characterization of Advanced Ceramic Materials Thin Films Deposited on Fe-C Substrate". Revista de Chimie, vol. 68, no. 11, pp. 2582-2587, 2017. [online]. https://doi.org/10.37358/RC.17.11.5933

Text
Costel Dorel Florea, Corneliu Munteanu, Nicanor Cimpoesu, Ioan Gabriel Sandu, Constantin Baciu, Costica Bejinariu,
Characterization of Advanced Ceramic Materials Thin Films Deposited on Fe-C Substrate,
Revista de Chimie,
Volume 68, Issue 11,
2017,
Pages 2582-2587,
ISSN 2668-8212,
https://doi.org/10.37358/RC.17.11.5933.
(https://revistadechimie.ro/Articles.asp?ID=5933)
Keywords: complex ceramic; plasma; SEM; EDAX; scratch

RIS
TY - JOUR
T1 - Characterization of Advanced Ceramic Materials Thin Films Deposited on Fe-C Substrate
A1 - Florea, Costel Dorel
A2 - Munteanu, Corneliu
A3 - Cimpoesu, Nicanor
A4 - Sandu, Ioan Gabriel
A5 - Baciu, Constantin
A6 - Bejinariu, Costica
JF - Revista de Chimie
JO - Rev. Chim.
PB - Revista de Chimie SRL
SN - 2668-8212
Y1 - 2017
VL - 68
IS - 11
SP - 2582
EP - 2587
UR - https://doi.org/10.37358/RC.17.11.5933
KW - complex ceramic
KW - plasma
KW - SEM
KW - EDAX
KW - scratch
ER -

BibTex
@article{RevCh2017P2582,
author = {Florea Costel Dorel and Munteanu Corneliu and Cimpoesu Nicanor and Sandu Ioan Gabriel and Baciu Constantin and Bejinariu Costica},
title = {Characterization of Advanced Ceramic Materials Thin Films Deposited on Fe-C Substrate},
journal = {Revista de Chimie},
volume = {68},
number = {11},
pages = {2582-2587},
year = {2017},
issn = {2668-8212},
doi = {https://doi.org/10.37358/RC.17.11.5933},
url = {https://revistadechimie.ro/Articles.asp?ID=5933}
}

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