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https://doi.org/10.37358/Rev.Chim.1949

OSIM Nr. R102355
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Revista de Chimie (Rev. Chim.), Year 2015, Volume 66, Issue 5,





LUCIAN CONSTANTIN, INES NITOI, IONUT CRISTEA, PETRUTA OANCEA, CRISTINA ORBECI, AURELIA CRISTINA NECHIFOR
Degradation of Triclosan by TiO2 - UV Irradiation
in Aqueous Solutions

Abstract:

Triclosan (TCS) 5 chloro - 2 - (2, 4 - dichlorophenoxy) phenol is an antimicrobial agent widely used for personal care products. Due to TCS persistence and toxicity, advanced oxidation processes constitute nowadays an alternative to TCS degradation. The UV/TiO2 degradation of TCS was investigated in the following working conditions: pH domain = 5.3-8.7; initial pollutant concentration [TCS]0 = 1 - 13.5 mg/L; photocatalyst dose [TiO2]0 = 100 - 500 mg/L; irradiation time t = 30 - 180 min; air flow Q air = 50 L/h. The TCS degradation was found to respect the Langmuir - Hinshelwood model. The constant of the degradation rate and the equilibrium constant of TCS adsorption on TiO2 particles were calculated. Keywords: triclosan, photocatalysis, TiO2, anatase, photo-dergradation


Issue: 2015, Volume 66, Issue 5
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