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https://doi.org/10.37358/Rev.Chim.1949

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Revista de Chimie (Rev. Chim.), Year 2004, Volume 55, Issue 11,





The Influence of the Limitation Process on the Characteristics of Photodetectors on PbS Basis

Abstract:

Photoconductive PbS thin films deposited on glass substrate by Chemical Bath Deposition (CBD) must be delimited for obtaining the suitable configuration. It was applied a photolithographic method using a positive photoresist AZ 1350. The influence of reagents and the other treatments used during this process, on the electrical (sheet electrical resistance) and photoelectrical parameters (specific detectivity), of photodetectors respectively was studied. The variation of the parameters was determined after each stage and overall. It was observed that the reagents and the treatments applied in the delimitation process, without reducing the photosensitive area, determined an average increasing of sheet electrical resistance with 40 % and noteworthy improving of detectivity. After diminution of photoconductive area 32,14 times, and adequate thermal treatment, the specific detectivity increased from 109 to 1011 cm·Hz1/2 w-1, at 300 K temperature. The studied photolithographic method could be applied successfully in photodetectors manufacturing. Keywords: photoconductive PbS thin films, chemical Bath Deposition, detectivity, photolithographic


Issue: 2004, Volume 55, Issue 11
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