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REVISTA DE CHIMIE
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https://doi.org/10.37358/Rev.Chim.1949

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Revista de Chimie (Rev. Chim.), Year 2006, Volume 57, Issue 1,





Growth of Titanium Dioxide Thin Laters by Low Pressure
Chemical Vapour Deposition and by Chemical Vapour Infiltration for Photocatalysis Applications


Abstract:

This report presents preliminary results of a work aiming the growth of titanium dioxide thin layers by Low-Pressure Chemical Vapour Deposition (LPCVD) and by Chemical Vapour Infiltration (CVI). These TiO2 coatings are grown on glass plates (LPCVD) and on porous substrates made of micro-fibres (13 - 17 ┬Ám in diameter) of fused silica (CVI). The precursor used as organometallic source was Ti(OiPr)4. The grown films were morphologically, optically and structurally characterized, and then submitted to photocatalytic tests using aqueous orange G solutions. The films grown on glass plates show a columnar growth mode. These films exhibit a good crystallinity and are constituted of anatase orientated (211) and (101) depending of their position in the reactor. The films grown on fused silica micro-fibres show a good surface coverage and exhibit a micro-porous structure due to the high surface curvature of the substrates. The photocatalytic activity was investigated for two TiO2 films with different thicknesses (70 and 200 nm) grown on porous samples. Keywords: chemical Vapour Deposition, chemical Vapour Infiltration, photocatalysis

Issue: 2006, Volume 57, Issue 1
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